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High-aspect ratio nanofabrication by femtosecond irradiation

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conference contribution
posted on 2024-07-09, 23:11 authored by Saulius JuodkazisSaulius Juodkazis, Toshiaki Kondo, Hiroaki Misawa
We report on three-dimensional (3D) recording of the high-aspect ratio (far = 18) structures by holographic exposure using femtosecond pulses in a SU8 resist. Thickness of free standing planes was approximately 100 nm.

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780392426

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Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

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2005

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1 p

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IEEE

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Copyright © 2005 IEEE. The published version is reproduced in accordance with the copyright policy of the publisher. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

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eng

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