Selective wet-etching of filtered arc deposited TiN films on Cr sacrificial layers
conference contribution
posted on 2024-07-26, 14:59 authored by Andrew J. Dowling, Muralidhar K. Ghantasala, Derry DoyleDerry Doyle, Erol C. HarveyAbstract not reproduced here by request of the publisher. The text is available from: http://dx.doi.org/10.1117/12.524048.
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0277-786XJournal title
SPIE Device and Process Technologies for MEMS, Microelectronics, and Photonics III Conference, Perth, Western Australia, Australia, 10 December 2003 / J. C. Chiao, A. J. Hariz, D. N. Jamieson, G. Parish and V. K. Varadan (eds.)Conference name
SPIE Device and Process Technologies for MEMS, Microelectronics, and Photonics III Conference, Perth, Western Australia, Australia, 10 December 2003 / J. C. Chiao, A. J. Hariz, D. N. Jamieson, G. Parish and V. K. Varadan eds.Volume
5276Pagination
7 ppPublisher
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Copyright © 2004 Society of Photo-Optical Instrumentation Engineers. This paper was originally published in Proceedings of SPIE (Vol. 5276), and is available from: http://dx.doi.org/10.1117/12.524048. The published version is reproduced in accordance with the copyright policy of the publisher. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content are prohibited.Language
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