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In situ third-order non-linear responses during laser reduction of graphene oxide thin films towards on-chip non-linear photonic devices

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journal contribution
posted on 2024-07-09, 17:21 authored by Xiaorui Zheng, Baohua Jia, Xi Chen, Min Gu
High-quality continuous GO thin films are prepared by using a self-assembly method. Z-scan measurements during the laser-induced reduction process unveiled in situ nonlinear responses in the GO film. Third-order nonlinear responses of the GO film could be tuned dynamically by varying the laser input fluence. GO thin films with tunable nonlinear responses and versatile patterning opportunities by using direct laser writing may serve as promising solid state materials for novel nonlinear functional devices.

Funding

ARC | DE120100291

History

Available versions

PDF (Accepted manuscript)

ISSN

1521-4095

Journal title

Advanced Materials

Volume

26

Issue

17

Pagination

2699-2703

Publisher

Wiley

Copyright statement

Copyright © 2014 Wiley-VCH. This the accepted version of the following article,'In situ third-order nonlinear responses during laser reduction of graphene oxide thin films towards on-chip nonlinear photonic devices', which has been published in final form at http://doi.org/10.1002/adma.201304681.

Language

eng

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