posted on 2024-07-09, 21:33authored byYaoyu Cao, Min Gu
We demonstrated an approach to break the diffraction limit and realise deep-subwavelength two-photon direct laser writing by employing a highly sensitive photoreduction process. The photoreduction photosensitivity increased by at least 4 times while the wavelength of the fabrication laser beam was tuned from 800 nm to 580 nm. The increase of the photosensitivity resulted in improved resolution for the silver dot fabrication. By developing the photoreduction material with adding electron donors, the photosensitivity further increased and enabled the realisation of a single silver dot at 22 nm which is λ/26 for the wavelength of the fabrication laser beam.
Funding
CE110001018:ARC
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