Suppression of interdiffusion in GaAs/AlGaAs quantum-well structure capped with dielectric films by deposition of gallium oxide
journal contribution
posted on 2024-08-06, 12:07 authored by L. Fu, J. Wong-Leung, P. N.K. Deenapanray, H. H. Tan, C. Jagadish, Bin Gong, R. N. Lamb, R. M. Cohen, W. Reichert, Lap Dao, M. GalAbstract not available.
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0021-8979Journal title
Journal of Applied PhysicsVolume
92Issue
7Pagination
4 ppPublisher
American Institute of PhysicsCopyright statement
Copyright © 2002 American Institute of Physics. The paper is reproduced in accordance with the copyright policy of the publisher.Language
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