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Two-Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

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posted on 2024-08-06, 12:12 authored by Hao Wang, Wang Zhang, Dimitra Ladika, Haoyi Yu, Darius Gailevičius, Hongtao Wang, Cheng Feng Pan, Parvathi Nair Suseela Nair, Yujie Ke, Tomohiro Mori, John You En Chan, Qifeng Ruan, Maria Farsari, Mangirdas Malinauskas, Saulius JuodkazisSaulius Juodkazis, Min Gu, Joel K.W. Yang
The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced 3D printing techniques, two-photon polymerization lithography (TPL) uniquely offers a significant advantage in nanoscale print resolution, and has been widely employed in diverse fields, for example, life sciences, materials sciences, mechanics, and microfluidics. More recently, by virtue of the optical transparency of most of the resins used, TPL is finding new applications in optics and photonics, with nanometer to millimeter feature dimensions. It enables the minimization of optical elements and systems, and exploration of light-matter interactions with new degrees of freedom, never possible before. To review the recent progress in the TPL related optical research, it starts with the fundamentals of TPL and material formulation, then discusses novel fabrication methods, and a wide range of optical applications. These applications notably include diffractive, topological, quantum, and color optics. With a panoramic view of the development, it is concluded with insights and perspectives of the future development of TPL and related potential optical applications.

Funding

Photonic crystals: The key to breaking the silicon-solar cell efficiency barrier

Australian Research Council

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PDF (Accepted manuscript)

ISSN

1616-3028

Journal title

Advanced Functional Materials

Volume

33

Issue

39

Article number

2214211

Publisher

Wiley

Copyright statement

Copyright © 2023 the authors. This is the author's final peer-reviewed accepted manuscript version, hosted under the terms and conditions of the Attribution 4.0 International (CC BY 4.0) license. See http://creativecommons.org/licenses/by/4.0/

Language

eng

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